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1 reactive-plasma etching
nELECTRON aplicación de plasma reactivo fEnglish-Spanish technical dictionary > reactive-plasma etching
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2 reactive plasma etching
Макаров: реактивное плазменное травлениеУниверсальный англо-русский словарь > reactive plasma etching
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3 reactive plasma etching
English-Russian electronics dictionary > reactive plasma etching
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4 reactive plasma etching
The New English-Russian Dictionary of Radio-electronics > reactive plasma etching
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5 reactive
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6 etching
- channel etching
- deep etching
- dry etching
- dry plasma etching
- electrolytic etching
- gas etching
- ion etching
- ion-beam sputter etching
- isotropic etching
- jet etching
- lift-off etching
- mask etching
- masked etching
- mesa etching
- oxide etching
- photochemical etching
- photoresist-mask etching
- plasma etching
- reactive ion etching
- reactive plasma etching
- RF sputter etching
- selective etching
- silicon etching
- silicon dioxide etching
- sputter etching
- substraction etching
- surface etching
- thermal etching
- vapor etching
- vapor-phase etching
- wet etching -
7 etching
- channel etching
- deep etching
- dry etching
- dry plasma etching
- electrolytic etching
- gas etching
- ion etching
- ion-beam sputter etching
- isotropic etching
- jet etching
- lift-off etching
- mask etching
- masked etching
- mesa etching
- oxide etching
- photochemical etching
- photoresist-mask etching
- plasma etching
- reactive ion etching
- reactive plasma etching
- RF sputter etching
- selective etching
- silicon dioxide etching
- silicon etching
- sputter etching
- substraction etching
- surface etching
- thermal etching
- vapor etching
- vapor-phase etching
- wet etchingThe New English-Russian Dictionary of Radio-electronics > etching
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8 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching -
9 etching
1) травление, протравливание2) гравирование3) гравюра4) клише•-
acid etching
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anode etching
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argon etching
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deep etching
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dip etching
- dry process etching -
dry etching
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electrolytic etching
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etching of grain boundaries
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glue etching
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ion-beam etching
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ion etching
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jet etching
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liquid etching
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matt etching
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mat etching
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mesa etching
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multitone etching
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neutral particle etching
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one-bite etching
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plasma reactor etching
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plasma etching
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powderless etching
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reactive etching
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selective etching
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side etching
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spray etching
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sputter etching
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thermal etching
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undercutting etching
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undercut etching
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wet etching
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window etching -
10 реактивное плазменное травление
Русско-английский словарь по электронике > реактивное плазменное травление
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11 реактивное плазменное травление
Русско-английский словарь по радиоэлектронике > реактивное плазменное травление
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12 реактивное плазменное травление
Makarov: reactive plasma etchingУниверсальный русско-английский словарь > реактивное плазменное травление
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13 реактивное ионное травление
1) Engineering: reactive ion milling2) Electronics: ion-assisted plasma etching3) Microelectronics: reactive ion etching, reactive-ion etchingУниверсальный русско-английский словарь > реактивное ионное травление
См. также в других словарях:
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Plasma etching — is a form of plasma processing used to fabricate integrated circuits. It involves a high speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Deep Reactive Ion Etching — Reaktives Ionentiefenätzen (engl. Deep Reactive Ion Etching, DRIE), eine Weiterentwicklung des reaktiven Ionenätzen (RIE), ist ein hoch anisotroper Trockenätzprozess für die Herstellung von Mikrostrukuren in Silicium mit Aspektverhältnissen (das… … Deutsch Wikipedia
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Plasma-unterstütztes Ätzen — (physikalisch chemisches Ätzen) bezeichnet eine Gruppe von subtraktiven (abtragenden) Mikrostrukturverfahren in der Halbleitertechnologie. Als Trockenätzverfahren stellen sie alternative Strukturierungsverfahren zum sog. Nassätzen (nasschemischen … Deutsch Wikipedia
Plasma processing — is a plasma based material processing technology that aims at modifying the chemical and physical properties of a surface.Plasma processing techniques include: *Plasma activation *Plasma modification *Plasma functionalization *Plasma… … Wikipedia
Plasma-Ätzen — Plasmaätzen ist ein materialabtragendes, plasmaunterstütztes, gaschemisches Trockenätz Verfahren, das besonders in der Halbleitertechnik, Mikrostrukturtechnologie und in der Displaytechnik großtechnisch eingesetzt wird. Der Begriff Plasmaätzen… … Deutsch Wikipedia
Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… … Wikipedia
